Influence of the negative R.F. bias voltage on the structural, mechanical and electrical properties of Hf–C–N coatings
| Autor: | Irantzu Llarena, Will F. Piedrahita, Julio C Caicedo, L. Emerson Coy, Luis Yate, Cesar Amaya |
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| Rok vydání: | 2016 |
| Předmět: |
010302 applied physics
Materials science Silicon Scanning electron microscope Analytical chemistry chemistry.chemical_element Biasing 02 engineering and technology Surfaces and Interfaces General Chemistry Nanoindentation 021001 nanoscience & nanotechnology Condensed Matter Physics 01 natural sciences Surfaces Coatings and Films symbols.namesake chemistry X-ray photoelectron spectroscopy Electrical resistivity and conductivity 0103 physical sciences Cavity magnetron Materials Chemistry symbols 0210 nano-technology Raman spectroscopy |
| Zdroj: | Surface and Coatings Technology. 286:251-255 |
| ISSN: | 0257-8972 |
| DOI: | 10.1016/j.surfcoat.2015.12.050 |
| Popis: | In this work Hf–C–N coatings were deposited on silicon substrates by reactive R.F. magnetron co-sputtering from two hafnium and carbon targets in a reactive nitrogen atmosphere at various negative bias voltages from 0 to 150 V. The effect of the bias voltage on the chemical composition, crystalline structure and mechanical properties was studied by X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM), Raman spectroscopy, X-ray diffraction (XRD) and nanoindentation. The results show that the obtained films have a Hf /( C + N ) ratio of around 1 and present an evolution with the bias voltage from a quasi-amorphous structure, with a low hardness (6 GPa) to crystalline Hf 2 CN films with a high hardness (23 GPa) and electrical resistivity values in the order of 10 4 Ω·cm − 1 . This study shows the potential for hard and electrically conductive Hf–C–N films in industrial applications. |
| Databáze: | OpenAIRE |
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