Wafer-Scale Bi-Assisted Semi-Auto Dry Transfer and Fabrication of High-Performance Monolayer CVD WS2 Transistor

Autor:	Ming-Yang Li, Ching-Hao Hsu, Shin-Wei Shen, Ang-Sheng Chou, Yuxuan Cosmi Lin, Chih-Piao Chuu, Ning Yang, Sui-An Chou, Lin-Yun Huang, Chao-Ching Cheng, Wei-Yen Woon, Szuya Liao, Chih-I Wu, Lain-Jong Li, Iuliana Radu, H.-S. Philip Wong, Han Wang
Rok vydání:	2022
Zdroj:	2022 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits).
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::67509489ffaaeb7df65cfbe746a642c6 https://doi.org/10.1109/vlsitechnologyandcir46769.2022.9830376 Zobrazit plný text záznamu