Application of Deposition Technique by the Applied Surface Discharge Plasma for Hard Carbon Thin Films

Autor:	Kiyotoshi Fujii, Shozo Inoue, Masayoshi Shimizu
Rok vydání:	2013
Předmět:	Carbon film Materials science Chemical engineering chemistry Mechanical Engineering chemistry.chemical_element Plasma Thin film Plasma processing Carbon Deposition (chemistry) Surface discharge
Zdroj:	Journal of the Japan Society for Precision Engineering. 79:529-534
ISSN:	1882-675X 0912-0289
DOI:	10.2493/jjspe.79.529
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::66faf387177dcde598a47b7cf65b4a33 https://doi.org/10.2493/jjspe.79.529 Zobrazit plný text záznamu