ChemInform Abstract: THE ANODIC OXIDATION OF VANADIUM- TRANSPORT NUMBERS OF METAL AND OXYGEN AND THE METAL OXYGEN RATIO IN THE OXIDE FILMS

Autor:	W. D. Mackintosh, H. H. Plattner
Rok vydání:	1976
Předmět:	Nuclear reaction Anodic oxidation Inorganic chemistry Oxide Vanadium chemistry.chemical_element General Medicine Oxygen Metal chemistry.chemical_compound Ion implantation chemistry visual_art visual_art.visual_art_medium
Zdroj:	Chemischer Informationsdienst. 7
ISSN:	0009-2975
Popis:	The techniques of ion implantation and Rutherford backscattering analysis were used to determine the transport numbers of metal and oxygen during the anodic oxidation of vanadium. These were found to be 0.28 +- 0.05 and 0.72 +- 0.05, respectively. The Rutherford backscattering analysis simultaneously gives the ratio of V/O in the film. This was found to be 0.4 +- 0.02 thus indicating that the films are V/sub 2/O/sub 5/. The result was confirmed by use of the nuclear reaction /sup 16/O(d,p)/sup 17/O. (auth)
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::66dbe0a36aab9d23fbe0505b02abfa46 https://doi.org/10.1002/chin.197627023 Zobrazit plný text záznamu Plný text