Advancements in organic antireflective coatings for dual-damascene processes

Autor:	Shreeram V. Deshpande, William J. Simmons, Joe Johnson, James E. Lamb, Nickolas L. Brakensiek, Xiaoming Wu, Xie Shao, Gu Xu
Rok vydání:	2000
Předmět:	Materials science Semiconductor device fabrication business.industry Copper interconnect Nanotechnology Semiconductor device engineering.material law.invention Anti-reflective coating Resist Coating law engineering Optoelectronics Photomask Photolithography business
Zdroj:	SPIE Proceedings.
ISSN:	0277-786X
DOI:	10.1117/12.386539
Popis:	Dual Damascene (DD) process has been implemented in manufacturing semiconductor devices with smaller feature sizes (
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::66cb1c02d9905ac9f786d1c17f3c55d5 https://doi.org/10.1117/12.386539 Zobrazit plný text záznamu