Studies on polycrystalline ZnS thin films grown by atomic layer deposition for electroluminescent applications
| Autor: | Sun Jin Yun, Yong Shin Kim |
|---|---|
| Rok vydání: | 2004 |
| Předmět: |
Chemistry
Hexagonal phase Analytical chemistry General Physics and Astronomy Surfaces and Interfaces General Chemistry Atmospheric temperature range Condensed Matter Physics Microstructure Surfaces Coatings and Films Crystallography Atomic layer deposition X-ray photoelectron spectroscopy Transmission electron microscopy Crystallite Thin film |
| Zdroj: | Applied Surface Science. 229:105-111 |
| ISSN: | 0169-4332 |
| Popis: | Polycrystalline ZnS thin films were grown by the atomic layer deposition (ALD) using the precursors of diethyl zinc and hydrogen sulfide in the substrate temperature range of 250–400 °C. The most uniform ALD growth was observed at 300 °C with the growth rate of 0.7 A per cycle. Atomic constituent analyses confirmed that as-deposited ZnS films were stoichiometric and contained no impurities of detectable amount. X-ray diffraction measurements revealed that crystalline structures were predominantly cubic in the temperature range of 250–350 °C and additional hexagonal phases began to appear at 400 °C. The dependence of surface morphology and crystalline microstructure on the ALD cycle number had also been investigated by using atomic force microscopy (AFM), cross-sectional transmission electron microscopy (TEM), and angle-resolved X-ray photoelectron spectroscopy (ARXPS). |
| Databáze: | OpenAIRE |
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