Voltammetric Modeling of the Kinetics Involved in the Nickel Deposition onto Nickel

Autor:	Liliana Altamirano-Garcia, Rosa Luna-Sánchez, Roman Cabrera-Sierra, Jorge Vazquez-Arenas
Rok vydání:	2010
Předmět:	Nickel Materials science chemistry Kinetics Inorganic chemistry Nickel deposition chemistry.chemical_element
Zdroj:	ECS Transactions. 29:135-143
ISSN:	1938-6737 1938-5862
DOI:	10.1149/1.3532311
Popis:	A comprehensive physicochemical model is used to account for the nickel electrodeposition in sulfate media employing a rotating disk electrode. The model accounts for the nickel deposition, H+ and water reduction. These reactions involve the reduction of Ni(II) by two consecutive 1-electron transfer steps and the H+ and water reduction via the two-step Volmer-Tafel mechanism. Diffusion and convection are considered in the mass-transport balances. Reasonable fits of the model to the experimental data were obtained at different NiSO4 concentrations. Further insights of this system show that the reduction process starting from the open circuit potential to more negative potentials occurs in the following order: H+ reduction, nickel deposition and water reduction. The computation of other variables involved in the model such as the surface pH and concentrations provide additional support to those finds elucidated with the model.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::668d51af50a2cdb498653e359d0fdc14 https://doi.org/10.1149/1.3532311 Zobrazit plný text záznamu