Stimulated ultraviolet emission from ZnO films annealed at high temperature
| Autor: | K. Wakatsuki, Y. Segawa, N.T. Binh, B.P. Zhang, C.Y. Liu |
|---|---|
| Rok vydání: | 2006 |
| Předmět: |
Materials science
Photoluminescence business.industry Annealing (metallurgy) Physics::Optics Condensed Matter Physics medicine.disease_cause Electronic Optical and Magnetic Materials Condensed Matter::Materials Science Semiconductor Condensed Matter::Superconductivity medicine Optoelectronics Metalorganic vapour phase epitaxy Stimulated emission Electrical and Electronic Engineering Thin film business Lasing threshold Ultraviolet |
| Zdroj: | Physica B: Condensed Matter. 381:20-23 |
| ISSN: | 0921-4526 |
| DOI: | 10.1016/j.physb.2005.11.172 |
| Popis: | We report the results of an experimental investigation of optically pumped lasing in ZnO thin films deposited on a sapphire substrate by the metal organic chemical deposition technique. The mechanism of lasing in the case of an as-grown film and in case of an annealed film was investigated. After annealing, the crystalline quality was improved. Optically pumped lasing in a film annealed at 900 °C for 2 h was achieved at room temperature. The threshold of lasing was estimated to be about 30 kW/cm2. |
| Databáze: | OpenAIRE |
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