CO2-laser-induced chemical vapour deposition of TiB2

Autor:	P.A. Quist, B. Rooswijk, J. van Nieuwkoop, J. Elders, J.D.W. van Voorst
Rok vydání:	1991
Předmět:	Co2 laser Materials science Surfaces and Interfaces General Chemistry Chemical vapor deposition Condensed Matter Physics Surfaces Coatings and Films chemistry.chemical_compound Co 2 laser chemistry Chemical engineering Materials Chemistry Growth rate Titanium diboride Deposition process
Zdroj:	Surface and Coatings Technology. 45:105-113
ISSN:	0257-8972
DOI:	10.1016/0257-8972(91)90212-f
Popis:	Titanium diboride (TiB 2 ) was photothermally deposited by the reduction of TiCl 4 and BCl 3 . A CO 2 laser was the only source of activation. A temperature feedback system was developed to increase the control of the CO 2 -laser-induced chemical vapour deposition (LCVD) process. In the LCVD process, powder production is prevented and high growth rates are obtained. The deposition process, which was optimized with respect to the growth rate, resulted in very hard TiB 2 coatings (VHN 25 3000 kg mm −2 ).
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::666359aea308a0d2f244324d7b3b8d80 https://doi.org/10.1016/0257-8972(91)90212-f Zobrazit plný text záznamu