Angular spectrum tailoring in solid immersion microscopy
| Autor: | S.B. Ippolito, Darrell L. Miles, Peilin Song, John Sylvestri |
|---|---|
| Rok vydání: | 2009 |
| Předmět: |
Materials science
business.industry ComputingMethodologies_IMAGEPROCESSINGANDCOMPUTERVISION Physics::Optics Hardware_PERFORMANCEANDRELIABILITY Dielectric Integrated circuit Laser Light scattering law.invention Angular spectrum method Computer Science::Hardware Architecture Optics Optical microscope Solid immersion lens law Microscopy Hardware_INTEGRATEDCIRCUITS business |
| Zdroj: | SPIE Proceedings. |
| ISSN: | 0277-786X |
| Popis: | We present a technique that involves tailoring the angular spectrum in optical microscopy of silicon integrated circuits, with a solid immersion lens. Spatial light modulation to select only supercritical light at the substrate/dielectric interface, yields only evanescent and scattered light in the interconnect layers. We demonstrated the technique in optical excitation microscopy of 65nm silicon-on-insulator circuits, which enabled localization of a fault during microprocessor development. Acquiring images with and without angular spectrum tailoring allowed longitudinal localization of the electrical response to optical excitation. Lateral registration of electrical response and confocal reflection images to the circuit layout was also significantly improved. |
| Databáze: | OpenAIRE |
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