Perpendicular giant magnetoresistance of microstructures in Fe/Cr and Co/Cu multilayers (invited)

Autor:	H. H. J. M. Janssen, M.A.M. Gijs, J. aan de Stegge, J. B. Giesbers, S.K.J. Lenczowski, M.T. Johnson, W. J. M. de Jonge, R.J.M. van de Veerdonk
Rok vydání:	1994
Předmět:	Materials science Magnetoresistance Condensed matter physics Scattering Etching (microfabrication) Ultra-high vacuum General Physics and Astronomy Giant magnetoresistance Reactive-ion etching Microstructure Molecular beam epitaxy
Zdroj:	Journal of Applied Physics. 75:6709-6713
ISSN:	1089-7550 0021-8979
Popis:	We discuss the fabrication and microstructuring techniques of pillar structures made of high vacuum sputtered Fe/Cr multilayers and of molecular beam epitaxy evaporated Co/Cu multilayers, for which we measured the giant magnetoresistance effect with the current perpendicular to the multilayer plane from 4 K to 300 K. Using optical lithography and reactive ion etching techniques we obtained structures with a typical height of 0.5 μm and a width ranging between 3 and 10 μm. For both Fe/Cr and Co/Cu multilayers we find an enhanced magnetoresistance with respect to the in‐plane case. The perpendicular magnetoresistance of the Fe/Cr pillars strongly decreases with temperature, while for the Co/Cu samples the temperature dependence is weaker, indicating electron‐magnon scattering processes of different strength.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::6605954ebae9e0d7bc9da226c2557b4f https://doi.org/10.1063/1.356847 Zobrazit plný text záznamu