Modeling Optical Lithography Physics
| Autor: | Eric Y. Chin, Andrew R. Neureuther, Juliet Rubinstein, Marshal A. Miller, Lynn T.-N. Wang, Chris Clifford, Kenji Yamazoe |
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| Rok vydání: | 2010 |
| Předmět: | |
| Zdroj: | Japanese Journal of Applied Physics. 49:06GA01 |
| ISSN: | 1347-4065 0021-4922 |
| DOI: | 10.1143/jjap.49.06ga01 |
| Popis: | Key physical phenomena associated with resists, illumination, lenses and masks are used to show the progress in models and algorithms for modeling optical projection printing as well as current simulation challenges in managing process complexity for manufacturing. The amazing current capability and challenges for projection printing are discussed using the 22 nm device generation. A fundamental foundation for modeling resist exposure, partial coherent imaging and defect printability is given. The technology innovations of resolution enhancement and chemically amplified resist systems and their modeling challenges are overviewed. Automated chip-level applications in pattern pre-compensation and design-anticipation of residual process variations require new simulation approaches. |
| Databáze: | OpenAIRE |
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