Photomodulated Reflectance Measurement Technique for Implantation Tilt Angle Monitoring
| Autor: | Janos Szivos, Tamas Szarvas, Adam Kun, J. Byrnes, Gyorgy Nadudvari, Reka Piros, Orsolya Almasi, Anita Pongracz, Eniko Kis, Leonard M. Rubin, Szabolcs Spindler, Ferenc Ujhelyi |
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| Rok vydání: | 2018 |
| Předmět: |
Materials science
business.industry Resolution (electron density) 0211 other engineering and technologies 020101 civil engineering 02 engineering and technology Reflectivity 0201 civil engineering Optics Tilt (optics) Ion implantation 021105 building & construction Process control Reflectivity measurement Wafer Sensitivity (control systems) business |
| Zdroj: | 2018 22nd International Conference on Ion Implantation Technology (IIT). |
| DOI: | 10.1109/iit.2018.8807949 |
| Popis: | Photo-modulated Reflectivity Measurement (PMR) is an excellent technology for implantation dose and tilt monitoring of as-implanted pre-annealed production wafers. SEMILAB PMR-3000 is an in-line monitoring unit for ion implantation monitoring use prior to the thermal annealing process step. The enhanced optical system ensures the measurement on the whole dose range without insensitive regions in the mid-dose range. Typical dose detectability is |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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