Application of an absolute pattern placement measuring tool for wafer metrology
| Autor: | K. Rinn |
|---|---|
| Rok vydání: | 1994 |
| Předmět: |
Computer science
Electronic engineering ComputerApplications_COMPUTERSINOTHERSYSTEMS Nanotechnology Wafer Overlay Electrical and Electronic Engineering Stepper Condensed Matter Physics Atomic and Molecular Physics and Optics Surfaces Coatings and Films Electronic Optical and Magnetic Materials Metrology |
| Zdroj: | Microelectronic Engineering. 23:399-402 |
| ISSN: | 0167-9317 |
| DOI: | 10.1016/0167-9317(94)90182-1 |
| Popis: | An absolute pattern placement measuring tool (Leitz LMS 2020) has been used for registration measurements on wafers for characterising stepper performance. The advantages of this approach are discussed, the measurement and evaluation procedure is outlined. Examples of results are presented to characterise both, single stepper performance and overlay between two steppers. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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