Dual-mode plasma-enhanced chemical vapor deposition (PECVD) of polymer-like a-C:H films: vibrational and optical properties
| Autor: | Bernard Drevillon, Jean-Eric Bourée, Christian Godet, R. Etemadi |
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| Rok vydání: | 1996 |
| Předmět: |
Absorption spectroscopy
Chemistry Mechanical Engineering Metals and Alloys Analytical chemistry Plasma Chemical vapor deposition Condensed Matter Physics Electronic Optical and Magnetic Materials Amorphous carbon Physics::Plasma Physics Mechanics of Materials Plasma-enhanced chemical vapor deposition Materials Chemistry Deposition (phase transition) Thin film Microwave |
| Zdroj: | Synthetic Metals. 76:191-194 |
| ISSN: | 0379-6779 |
| DOI: | 10.1016/0379-6779(95)03450-x |
| Popis: | A dual-mode microwave (MW)-radio frequency (RF) plasma reactor has been used for the deposition of hydrogenated amorphous carbon (a-C:H) thin films. Butane is injected and decomposed in the post-discharge of a helium-argon MW plasma, assisted by an RF plasma of variable power (0–100 W). It has been observed that the energy of the ion bombardment on the substrate, monitored by the RF power, controls the optical properties. The dielectric function is parametrized using either a single classical oscillator or a three-phase effective medium approximation. The deposition rate and the extinction coefficient of a-C:H increase with the RF power, indicating an increase of the trigonal sp2 bonding configurations. Simultaneously, the IR absorption spectroscopy gives evidence of a decreasing H content and increasing C = CH2 configurations. |
| Databáze: | OpenAIRE |
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