Application of Quantum Cascade Laser Absorption Spectroscopy for Correlation Studies in Plasma Etching Processes in the Semiconductor Industry
| Autor: | J. H. van Helden, Stefan E. Schulz, Norbert Lang, B. Uhlig, Jürgen Röpcke, U. Macherius, Sven Zimmermann, Matthias Schaller, H. Zimmermann |
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| Rok vydání: | 2018 |
| Předmět: |
Materials science
Plasma etching Absorption spectroscopy business.industry fungi technology industry and agriculture macromolecular substances Plasma Laser law.invention Semiconductor industry stomatognathic system law Etching (microfabrication) Molecule Optoelectronics Quantum cascade laser business |
| Zdroj: | High-Brightness Sources and Light-driven Interactions. |
| DOI: | 10.1364/mics.2018.mt3c.2 |
| Popis: | Applying quantum cascade laser absorption spectroscopy a correlation could be demonstrated between the concentration of the etching products SiF4 and CO and the etching rate of ultra-low-k SiCOH in a low-pressure rf plasma containing CF4. |
| Databáze: | OpenAIRE |
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