EUV lithography line-space pattern rectification using block copolymer directed self-assembly: a roughness and defectivity study

Autor:	Julie Van Bel, Lander Verstraete, Hyo Seon Suh, Stefan De Gendt, Philippe Bezard, Jelle Vandereyken, Waikin Li, Matteo Beggiato, Amir-Hossein Tamaddon, Christophe Beral, Andreia Santos, Boaz Alperson, YoungJun Her
Rok vydání:	2023
Zdroj:	Novel Patterning Technologies 2023.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::64806be415ce6f6dafa17486845c4c96 https://doi.org/10.1117/12.2657990 Zobrazit plný text záznamu