In-situ Plasma Conditioning of InGaAs / High-κ Interface Layers for Defect Density Control Compatible with Scalable FinFET Integration
Autor: | J. Rozen, Y. Ogawa, M. Hatanaka, T. Ando, E. Cartier, M.M. Frank, M. Hopstaken, J. Bruley, K.-T. Lee, J.-B. Yau, Y. Sun, R.L. Bruce, C. D'Emic, X. Sun, K. Suu, R.T. Mo, E. Leobandung, V. Narayanan |
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Rok vydání: | 2018 |
Předmět: | |
Zdroj: | Extended Abstracts of the 2018 International Conference on Solid State Devices and Materials. |
Databáze: | OpenAIRE |
Externí odkaz: |