Coater/developer based techniques to achieve sub-30nm CAR process on EUV stack

Autor:	Kanzo Kato, Lior Huli, Dave Hetzer, Satoru Shimura, Shinichiro Kawakami, Soichiro Okada, Takahiro Kitano, Akihiro Sonoda, Karen Petrillo, Luciana Meli, Cody Murray, Alex Hubbard
Rok vydání:	2022
Zdroj:	Advances in Patterning Materials and Processes XXXIX.
DOI:	10.1117/12.2613805
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::64495d07f491b080d950ef1d71c013f4 https://doi.org/10.1117/12.2613805 Zobrazit plný text záznamu