Circle Patterning Technology with Negative Tone Development for ArF Immersion Extension

Autor:	Cheol-Kyu Bok, Donggyu Yim, Jaeheon Kim, Junggun Hao, Changil Oh, Junghung Lee
Rok vydání:	2011
Předmět:	Materials science Polymers and Plastics business.industry Extreme ultraviolet lithography Organic Chemistry Contact hole Tone (musical instrument) Flash (photography) Optics Resist Materials Chemistry Immersion (virtual reality) Development (differential geometry) Process window business
Zdroj:	Journal of Photopolymer Science and Technology. 24:497-501
ISSN:	1349-6336 0914-9244
Popis:	Contact hole patterning for half pitch 51nm can be achieved by single exposure for mass production and for half pitch 39nm can be achieved by Litho-Etch-Litho-Etch (LELE). Currently for half pitch 32nm there is no promising solution so far, but ouble patterning and extreme ultraviolet lithography (EUV) are still competing each other for this target. In the current situation of contact hole patterning, single exposure negative tone development (NTD) shows excellent contact hole performance on fidelity, process window and CD uniformity compared to positive tone development (PTD) and finally enables to define half pitch below 50nm. In this paper, we describe necessity for circle patterning on 3-D flash, optimization of exposure condition, upgrade status of resist and device speed of 3-D flash on negative tone development (NTD) process.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::63b62af816e6ba850ad1a76c21d99f48 https://doi.org/10.2494/photopolymer.24.497 Zobrazit plný text záznamu