Photoemission and electron mean free paths in liquid formamide in the vacuum UV

Autor:	J. C. Ashley, L. R. Painter, H. H. Hubbell, J. M. Heller, R. D. Birkhoff
Rok vydání:	1982
Předmět:	Argon chemistry Secondary emission Surface plasmon General Physics and Astronomy chemistry.chemical_element Electron Physical and Theoretical Chemistry Atomic physics Photoelectric effect Plasmon Excitation Ion
Zdroj:	The Journal of Chemical Physics. 76:5208-5213
ISSN:	1089-7690 0021-9606
DOI:	10.1063/1.442915
Popis:	Our apparatus has been modified to permit measurements of absolute photoemission as well as reflectance of liquids in the vacuum UV. Photon fluxes are determined by filling the tandem ion chambers with argon. An electrometer is connected to the sample cup, which must be properly biased, to read electron currents leaving the cup. After argon ion drift into the cup is taken into account, the yields of photoelectrons per incident photon and per absorbed photon are obtained. These yield curves for liquid formamide (HCONH2) are similar to each other over the energy range studied (16–25 eV). They are nearly constant between 16 and 18 eV at 13.5% and decline toward higher energies. The surface and volume plasmon energies for formamide are near 19 and approximately 27 eV, respectively. We suggest that photoelectron excitation of surface plasmons may enhance the photoemission yield, while excitation of volume plasmons may reduce it. Values of electron mean free path derived from the yields and a simple three‐step ...
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::63a92eac4bc2418cdfa13ecd55d0dc22 https://doi.org/10.1063/1.442915 Zobrazit plný text záznamu