High‐Temperature Gas Viscosities. II. Nitrogen, Nitric Oxide, Boron Trifluoride, Silicon Tetrafluoride, and Sulfur Hexafluoride

Autor:	C. J. G. Raw, C. P. Ellis
Rok vydání:	1959
Předmět:	Range (particle radiation) Intermolecular force Inorganic chemistry General Physics and Astronomy chemistry.chemical_element Nitrogen Nitric oxide Sulfur hexafluoride chemistry.chemical_compound Viscosity chemistry Silicon tetrafluoride Physical and Theoretical Chemistry Boron trifluoride
Zdroj:	The Journal of Chemical Physics. 30:574-576
ISSN:	1089-7690 0021-9606
DOI:	10.1063/1.1729989
Popis:	The viscosities of nitrogen (from 700° to 1000°), nitric oxide (from 100° to 1000°), boron trifluoride (from 180° to 500°), silicon tetrafluoride (from 200° to 330°C), and sulfur hexafluoride (from 200° to 850°C) have been measured using a specially constructed silica apparatus described in Part I of this series. In addition, our previous results for SiF4 have been recalculated in the low‐temperature range down to room temperature. These results are discussed from the point of view of the intermolecular forces, and the molecular interaction parameters are compared with those calculated from data on gas viscosities in the lower temperature ranges. The results show the temperatures at which thermal dissociation of the compounds becomes important, and the viscosity measurements are not carried very far beyond these temperatures.
Databáze:	OpenAIRE
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