| Autor: |
S. Uzawa, T. Tsuji, Takayuki Hasegawa, Hiroyoshi Kubo |
| Rok vydání: |
2007 |
| Předmět: |
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| Zdroj: |
2007 Digest of papers Microprocesses and Nanotechnology. |
| Popis: |
Canon has been developing the EUVL technologies for more than ten years. The current development status of EUVL technologies is presented. The small field exposure tool (SFET) is positioned as a cornerstone of the manufacturing technologies for the EUVL beta tool. LPP source and the DPP source are the most expecting methods for the EUVL beta tools. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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