Modification of stearic acid in Ar and Ar-O2 pulsed DC discharge

Autor: A.M. Maliska, Euclides Alexandre Bernardelli, Marcio Mafra, Aloisio Nelmo Klein, T. Souza, Thierry Belmonte
Rok vydání: 2011
Předmět:
Zdroj: Materials Research. 14:519-523
ISSN: 1980-5373
1516-1439
Popis: in all states) enhance the etching process, regardless of their concentration. During the treatments, a liquid phase developed at the melting temperature of stearic acid, and differential thermal analyses showed that the formation of a liquid phase was associated with the breakage of bonds due to treatment with an Ar or Ar-O
Databáze: OpenAIRE