Thermally Stable Alkylsulfonium Salts for ArF Excimer Laser Resists

Autor:	Katsumi Maeda, Shigeyuki Iwasa, Kaichiro Nakano, Etsuo Hasegawa
Rok vydání:	2001
Předmět:	Materials science Polymers and Plastics Excimer laser Resist medicine.medical_treatment Organic Chemistry Materials Chemistry medicine Photoacid generator Photochemistry
Zdroj:	Journal of Photopolymer Science and Technology. 14:357-362
ISSN:	1349-6336 0914-9244
DOI:	10.2494/photopolymer.14.357
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::635ed333a02d554a1904b77445b35608 https://doi.org/10.2494/photopolymer.14.357 Zobrazit plný text záznamu