X-ray photoelectron and vibrational spectroscopic studies of TeC:H films for optical disk memory
| Autor: | Nobuaki Yasuda, Hideki Ohkawa, Motonari Matsubara, Norio Ozawa |
|---|---|
| Rok vydání: | 1994 |
| Předmět: |
Metals and Alloys
Analytical chemistry chemistry.chemical_element Surfaces and Interfaces Electronic structure Spectral line Surfaces Coatings and Films Electronic Optical and Magnetic Materials Amorphous solid symbols.namesake chemistry X-ray photoelectron spectroscopy Sputtering Materials Chemistry symbols Thin film Tellurium Raman spectroscopy |
| Zdroj: | Thin Solid Films. 237:91-97 |
| ISSN: | 0040-6090 |
| DOI: | 10.1016/0040-6090(94)90243-7 |
| Popis: | The valence band spectrum of a TeC:H film was found to be essentially the same as that of amorphous elemental tellurium using X-ray photoelectron spectroscopy. Raman and Fourier transform far-IR spectra were examined based on the phonon density of states for tellurium, and the far-IR peak corresponding to the vibration of amorphous tellurium was identified at 150 cm−1. Organic TeC bonding was found in the TeC:H film, and the origin of this bonding is discussed by taking into consideration the deposition process, including surface reaction on the tellurium target. The chemical sputtering process is suggested to contribute to the deposition of TeC:H film. |
| Databáze: | OpenAIRE |
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