Pulsed methods of thin film coatings deposition

Autor:	A V Gurov, Y V Panfilov
Rok vydání:	2021
Předmět:	History Materials science business.industry Vacuum arc Sputter deposition Nanocrystalline material Computer Science Applications Education Amorphous solid Pulsed laser deposition Deposition (phase transition) Optoelectronics High-power impulse magnetron sputtering Thin film business
Zdroj:	Journal of Physics: Conference Series. 1954:012035
ISSN:	1742-6596 1742-6588
DOI:	10.1088/1742-6596/1954/1/012035
Popis:	The most known methods of pulsed thin film deposition such as magnetron sputtering HIPIMS, pulsed laser deposition PLD, vacuum arc pulsed deposition, high-intensity pulsed ion beams deposition HIPIB, as well, were described and analysed. It was shown that the stream of material, generated by means of a pulsed action, impacts to substrate and creates preconditions for nanocrystalline amorphous coating manufacture with superhigh hardness.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::633798a756f1ae8dba249d786676f5ba https://doi.org/10.1088/1742-6596/1954/1/012035 Zobrazit plný text záznamu