Chemical reactions at metallic and metal/semiconductor interfaces stimulated by pulsed laser annealing
| Autor: | E.J. Petit, R. Caudano |
|---|---|
| Rok vydání: | 1992 |
| Předmět: |
Auger electron spectroscopy
Materials science Scanning electron microscope Analytical chemistry Intermetallic General Physics and Astronomy Surfaces and Interfaces General Chemistry Condensed Matter Physics Rutherford backscattering spectrometry Chemical reaction Surfaces Coatings and Films X-ray photoelectron spectroscopy Thin film Ohmic contact |
| Zdroj: | Applied Surface Science. 54:405-409 |
| ISSN: | 0169-4332 |
| DOI: | 10.1016/0169-4332(92)90079-d |
| Popis: | Multilayer Al/Sb thin films have been evaporated on GaSb single crystals in ultra-high vacuum and pulsed-laser irradiated in-situ above the energy density threshold for surface melting. Superficial and interfacial chemical reactions have been characterized in-situ by Auger electron spectroscopy; and later, by X-ray photoelectron spectroscopy profiling, Rutherford backscattering spectrometry and scanning electron microscopy. The chemical reaction between the Al and Sb films is considered as a model reaction for laser-assisted synthesis of high-purity intermetallic compounds. The observation of a strong interfacial reaction between the melted film and the substrate is also a subject of great concern for optical data recording and laser alloying of ohmic contacts on semiconductors. We show that a suitable choice of the substrate and adding a low surface tension element into the metallic film can improve its stability during melting, and prevent inhomogeneous reaction and formation of holes, cracks and particles. Finally, other solutions are suggested to improve the control of these reactions. |
| Databáze: | OpenAIRE |
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