Electrodeposition of Metal Alloy and Mixed Oxide Films Using a Single‐Precursor Tetranuclear Copper‐Nickel Complex

Autor: Christopher E. Dubé, Geoffrey Davies, M. Levant Aksub, Albert Robbat, Bizuneh Workie, Samuel P. Kounaves
Rok vydání: 1995
Předmět:
Zdroj: Journal of The Electrochemical Society. 142:3357-3365
ISSN: 1945-7111
0013-4651
DOI: 10.1149/1.2049987
Popis: Electroreduction of heterotetranuclear complexes ({mu}{sub 4}-O)L{sub 4}Cu{sub 4{minus}x}Ni{sub x}(H{sub 2}O){sub x}Cl{sub 6} (x = 1--4,L = N,N-diethylnicotinamide) at a Pt electrode in dimethylsulfoxide leads to deposition of Cu-Ni alloys with codeposition of Cu(I) oxide, Ni(II) oxide, and Ni(II) hydroxide. The alloy deposition potential is invariant with complex stoichiometry. Alloy Ni composition, determined by X-ray diffraction (XRD), increases from 12% for x = 1 to 62% for x = 4. The microscopically rough, well-adhering, continuous films have a natural passivation layer formed by air oxidation that consists of Ni(OH){sub 2}, NiO, Cu(OH){sub 2}, and Cu{sub 2}O. X-ray photoelectron spectroscopy confirmed the bulk film alloy compositions obtained by XRD. The data revealed complex deposit structures consisting of NiO, Ni(OH){sub 2}, Cu{sub 2}O, and Cu-Ni alloy giving a mass balance of the metals in the complexes. The Cu{sub 2}O/Cu{sup 0} ratio is close to unity for the deposit made from the Cu{sub 4} complex and decreases to zero for the CuNi{sub 3} complex. In contrast only half of the Ni(II) centers are deposited as Ni{sup 0} in the Cu-Ni alloy, the balance consisting of 37% NiO and 15% Ni(OH){sub 2}. The constant percentage of Ni as Ni(OH){sub 2} in all deposits suggests thatmore » it arises from reduction of Ni coordinated water. Mass balance indicates O in Cu{sub 2}O and NiO originates from the {mu}{sub 4}-O. Smooth variations of alloy compositions, metal oxide/metal ratios, and film particle sizes indicate that all the electrode processes involve discrete molecules of the heteropolymetallic complex.« less
Databáze: OpenAIRE