Plasma-enhanced chemical vapor deposition of nitrides on fluidized particles

Autor:	Gilles Flamant, Germán Mazza, Daniel J. Gauthier, Raymond Flamand, J. M. Badie, I. Sanchez
Rok vydání:	2001
Předmět:	Hydrogen Atmospheric pressure General Chemical Engineering chemistry.chemical_element Mineralogy equipment and supplies Microanalysis Electric arc Plasma arc welding chemistry Chemical engineering Plasma-enhanced chemical vapor deposition Fluidized bed Tin
Zdroj:	Powder Technology. 120:134-140
ISSN:	0032-5910
Popis:	A new plasma jet fluidized bed reactor working at atmospheric pressure is presented. The plasma arc is created inside the bed of particles in order to improve the reactivity between excited gaseous species and the particles to be coated. Metal chlorides, nitrogen and hydrogen were used as precursors of deposited layers. TiN, Si3N4 and SiOx coatings were deposited on silica and corundum particles by this plasma-assisted CVD process. Optical emission spectroscopy and electron microanalysis characterized the plasma and the layer composition, respectively.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::62ed4cef7af8a061e440e3a3bcbbd479 https://doi.org/10.1016/s0032-5910(01)00360-6 Zobrazit plný text záznamu Full Text from ScienceDirect