Submicrometer‐resolution etching of integrated circuit materials with laser‐generated atomic fluorine
| Autor: | M. D. Tabat, G. L. Loper |
|---|---|
| Rok vydání: | 1985 |
| Předmět: |
Silicon
business.industry Chemistry fungi technology industry and agriculture Analytical chemistry General Physics and Astronomy chemistry.chemical_element macromolecular substances Engraving law.invention Semiconductor stomatognathic system law visual_art visual_art.visual_art_medium Optoelectronics Dry etching Reactive-ion etching Photolithography Thin film business Lithography |
| Zdroj: | Journal of Applied Physics. 58:3649-3651 |
| ISSN: | 1089-7550 0021-8979 |
| DOI: | 10.1063/1.335748 |
| Popis: | We have demonstrated submicrometer‐resolution lithography by ultraviolet laser‐induced radical etching. We previously showed that this method can provide highly specific and efficient etching of various refractory metal/insulator and semiconductor/insulator substrate combinations. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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