Effect of annealing and oxygen partial pressure on the RF sputtered WO3 thin films for electrochromic applications
Autor: | Habibuddin Shaik, Sheik Abdul Sattar, K. Naveen Kumar, R. Imran Jafri, Amulya Pawar, G. Ashok Reddy, G. Nithya, Jyothi Gupta, V. Madhavi, L.N. Chandrashekar |
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Rok vydání: | 2022 |
Předmět: | |
Zdroj: | Materials Today: Proceedings. 59:339-344 |
ISSN: | 2214-7853 |
Databáze: | OpenAIRE |
Externí odkaz: |