Characteristics of surface recombination in silicon diode isolation grooves

Autor: E. Gaubas
Rok vydání: 2007
Předmět:
Zdroj: Lithuanian Journal of Physics. 47:461-464
ISSN: 1648-8504
DOI: 10.3952/lithjphys.47410
Popis: Carrier surface recombination characteristics are investigated in silicon high voltage diodes with glass isolated grooves by microwave probed photoconductivity transients (MW-PCT) combining different excitation depths within the layered device structures. Comparative analysis of recombination parameters in the device isolation grooves and layered wafers passivated by iodinenethanol solutions is performed to evaluate surface recombination rates. It has been revealed that electrochemical etchingnglass melting steps involved within the passivation technological procedures for fabrication of diode isolation grooves induce a decrease of surface recombination velocity from 3¢10 3 to 10 cm=s.
Databáze: OpenAIRE