Formation of silicon surface gratings with high-pulse-energy ultraviolet laser

Autor:	S. Gurtler, Kung-Jeng Ma, Chee-Wee Liu, Chih-Chung Yang, Yen-Sheng Lin, Chung-Yen Chao, Hsu Chih-Wei, Cheng-Yen Chen
Rok vydání:	2000
Předmět:	Materials science Laser ablation Silicon business.industry General Physics and Astronomy chemistry.chemical_element Grating Laser Fluence law.invention Optics Semiconductor chemistry Etching (microfabrication) law Optoelectronics business Diffraction grating
Zdroj:	Journal of Applied Physics. 88:6162-6169
ISSN:	1089-7550 0021-8979
Popis:	We report the morphology, composition, and interaction mechanisms of silicon surface gratings fabricated with the fourth harmonic (266 nm) of a Q-switched Nd:YAG laser. We paid particular attention to the laser fluence dependence of silicon grating formation. It was found that at low fluence levels, grating formation was mainly caused by silicon oxidation. However, at high fluence levels gratings were formed with thermal ablation. In the former case, it was found that water vapor, instead of oxygen molecules, in the air was the key species providing oxygen for silicon oxidation. In the latter case, grating morphology was controlled by laser fluence level. These conclusions were supported by the measurement results of atomic force microscopy, energy-dispersive x-ray spectroscopy, Fourier-transform infrared spectroscopy, and chemical etching. The results of real-time monitoring of grating growth are also reported.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::61e75a133892a24b7301f4af70208dbc https://doi.org/10.1063/1.1309038 Zobrazit plný text záznamu