Evaluation of Post Dry-etching Roughness in ArF Resists by Spectroscopic Ellipsometry Analysis

Autor:	Yasushi Gotoh, Toshihiko Tanaka, Ryoko Yamanaka
Rok vydání:	2003
Předmět:	Materials science Polymers and Plastics Organic Chemistry technology industry and agriculture Analytical chemistry Surface finish Resist Etching (microfabrication) Ellipsometry Materials Chemistry Surface roughness Spectroscopic ellipsometry Dry etching Composite material Refractive index
Zdroj:	Journal of Photopolymer Science and Technology. 16:517-522
ISSN:	1349-6336 0914-9244
DOI:	10.2494/photopolymer.16.517
Popis:	Spectroscopic ellipsometry was used to evaluate the surface roughness of dry-etched resists as a simple form of non-destructive analysis. The resist film was analyzed with two kinds of multi-layer models. The dry-etched resist was estimated to have a bulk region and a surface region in which the refractive index decreased closer to the top surface. The 2-layer model was useful in comparing the surfae roughness among various resists. Results of this method are consistent with that of AFM analysis and SEM inspection.
Databáze:	OpenAIRE
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