Effect of hydrofluorocarbon structure of C3H2F6 isomers on high aspect ratio etching of silicon oxide

Autor:	Hyun Woo Tak, Hye Joo Lee, Long Wen, Byung Jin Kang, Dain Sung, Jeong Woon Bae, Dong Woo Kim, Wonseok Lee, Seung Bae Lee, Keunsuk Kim, Byeong Ok Cho, Young Lea Kim, Han Dock Song, Geun Young Yeom
Rok vydání:	2022
Předmět:	General Physics and Astronomy Surfaces and Interfaces General Chemistry Condensed Matter Physics Surfaces Coatings and Films
Zdroj:	Applied Surface Science. 600:154050
ISSN:	0169-4332
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::61881d1dceeee0023caa246e84719760 https://doi.org/10.1016/j.apsusc.2022.154050 Zobrazit plný text záznamu Full Text from ScienceDirect