Epitaxial KNbO3thin films on KTaO3, MgAl2O4, and MgO substrates

Autor:	A. F. Chow, N. R. Parikh, R. R. Woolcott, T. M. Graettinger, Angus I. Kingon, Daniel J. Lichtenwalner, Lynn A. Boatner, Orlando Auciello
Rok vydání:	1994
Předmět:	Materials science Potassium niobate Physics and Astronomy (miscellaneous) Scattering Analytical chemistry Mineralogy Substrate (electronics) Sputter deposition Epitaxy chemistry.chemical_compound chemistry Orthorhombic crystal system Thin film Refractive index
Zdroj:	Applied Physics Letters. 65:1073-1075
ISSN:	1077-3118 0003-6951
DOI:	10.1063/1.112129
Popis:	Epitaxial potassium niobate (KNbO3) thin films have been deposited on KTaO3 (100), MgAl2O4 (100), and MgO (100) substrates using ion‐beam sputter deposition. X‐ray‐diffraction results show that KNbO3 films have orthorhombic (110) orientation on all three substrates. Rutherford backscattering channeling analysis of KNbO3 films on KTaO3, MgAl2O4, and MgO exhibits minimum scattering yields (χmin) of 7%, 9%, and 18% for the Nb peak, respectively. This illustrates how the quality of epitaxy improves as the lattice mismatch decreases. Prism‐coupling measurements reveal near‐bulk refractive indices of about 2.27 for TE modes and 2.22 for TM modes for films on each substrate.
Databáze:	OpenAIRE
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