Optical emission study of CH4+CHF3 ECR plasma and properties of a-C:F:H films
| Autor: | Z.Y Ning, Shanhua Cheng, S. Huang, C.N Ye, Yu Xin, W Du, S.L Xiang, Jian Chen, X.H. Lu |
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| Rok vydání: | 2003 |
| Předmět: |
Actinometer
Materials science Band gap Analytical chemistry Infrared spectroscopy Surfaces and Interfaces General Chemistry Condensed Matter Physics Electron cyclotron resonance Fourier transform spectroscopy Surfaces Coatings and Films law.invention law Materials Chemistry Light emission Fourier transform infrared spectroscopy Spectroscopy |
| Zdroj: | Surface and Coatings Technology. 173:172-177 |
| ISSN: | 0257-8972 |
| DOI: | 10.1016/s0257-8972(03)00624-8 |
| Popis: | a-C:F:H films were prepared with a mixture of CH 4 and CHF 3 gases by microwave electron cyclotron resonance chemical vapor deposition method. An actinometer optical emission spectroscopy was used to reveal the trend in the concentration of some species (H, F, C 2 , CH etc.) as a function of flow ratio R {[CHF 3 ]/([CHF 3 ]+[CH 4 ])}. The results from Fourier transform infrared transmission spectroscopy showed the structural evolution of a-C:F:H films with variable gas flow ratios R . This structural evolution had an influence on the film optical band gap. The optical band gap decreased with the increasing flow ratios R in the polymer-like region, while it increased in the PTFE-like region. The correlation between the C 2 species density and the properties of a-C:F:H films is also discussed. |
| Databáze: | OpenAIRE |
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