Direct, high throughput LIGA for commercial applications: a progress report
| Autor: | Shamus McNamara, M. R. Ramotowski, C. Kirk, E. Stiers, E. D. Johnson, B. Chaudhuri, Henry Guckel, K. Fischer |
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| Rok vydání: | 2000 |
| Předmět: |
Engineering drawing
Materials science Silicon business.industry chemistry.chemical_element Substrate (electronics) Condensed Matter Physics Electronic Optical and Magnetic Materials chemistry Hardware and Architecture Plating Electroforming Optoelectronics Wafer X-ray lithography Electrical and Electronic Engineering LIGA Absorption (electromagnetic radiation) business |
| Zdroj: | Microsystem Technologies. 6:103-105 |
| ISSN: | 1432-1858 0946-7076 |
| Popis: | Direct LIGA; LIGA without injection molding; has the potential to become a cost effective, high throughput form of LIGA. The process requires high energy photons; near 20,000 eV; which are best produced in facilities such as the X-ray ring at Brookhaven National Laboratory. The increased absorption lengths over lower energy photons eliminates the need for a membrane type X-ray mask. This in turn facilitates very large area X-ray masks fabricated from standard silicon wafers with 20 μm gold absorbers. The absorption length increase in PMMA to 2 cm is used to implement stacked PMMA exposures in which 1 mm thick PMMA layers are used to produce exposed PMMA sheets. These sheets are eventually solvent bonded to working substrates with plating bases. |
| Databáze: | OpenAIRE |
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