Experimental study of spatial nonuniformities in 100MHz capacitively coupled plasma using optical probe
| Autor: | V. G. Pashkovsky, Vladimir Volynets, K. S. Jeong, T. Y. Kwon, J. B. Lee, Andrey Ushakov, Yu.N. Tolmachev, Dougyong Sung |
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| Rok vydání: | 2008 |
| Předmět: |
Argon
chemistry.chemical_element Atmospheric-pressure plasma Surfaces and Interfaces Plasma Condensed Matter Physics Surfaces Coatings and Films chemistry Physics::Plasma Physics Etching (microfabrication) Capacitively coupled plasma Gas composition Emission spectrum Reactive-ion etching Atomic physics |
| Zdroj: | Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 26:406-415 |
| ISSN: | 1520-8559 0734-2101 |
| DOI: | 10.1116/1.2899413 |
| Popis: | Plasma spatial nonuniformities in the 100MHz rf driven capacitively coupled reactor used for reactive ion etching of 300mm substrates were experimentally studied using a linear scanning optical emission spectroscopy probe. Radial profiles of plasma emission intensity were measured both in argon and fluorocarbon-containing gas mixtures in the pressure interval of 10–80mTorr and the rf power range of 500–1250W. It was demonstrated that the plasma emission profiles strongly depend on the working gas composition and pressure. The profiles have a bell-like shape at pressures about 10mTorr for all gases. As the pressure increases, the profile shape becomes more complex with the central and peripheral peaks, and the amplitudes of the peaks strongly depend on the working gas composition. It is suggested that the emission profiles show plasma spatial nonuniformities that can influence the etching rate profiles obtained with such systems. According to the existing theoretical models, the most probable reasons for t... |
| Databáze: | OpenAIRE |
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