A Novel Process to Improve the Surface Roughness of RuO[sub 2] Film Deposited by Metallorganic Chemical Vapor Deposition
| Autor: | Seok-Hong Min, Ki-Bum Kim, Hyun-Mi Kim, Sung‐Eon Park |
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| Rok vydání: | 1999 |
| Předmět: |
Materials science
Chemical engineering Hybrid physical-chemical vapor deposition General Chemical Engineering Scientific method Electrochemistry Surface roughness General Materials Science Chemical vapor deposition Electrical and Electronic Engineering Physical and Theoretical Chemistry Combustion chemical vapor deposition |
| Zdroj: | Electrochemical and Solid-State Letters. 1:262 |
| ISSN: | 1099-0062 |
| DOI: | 10.1149/1.1390706 |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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