Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition

Autor:	Chang Wan Lee, Hyungjun Kim, Kyung Yong Ko, Jae Min Myung, Kangsik Kim, Clement Lansalot-Matras, Han-Bo-Ram Lee, Il Kwon Oh, Wontae Noh, Christian Dussarrat, Su Jeong Lee, Zonghoon Lee
Rok vydání:	2014
Předmět:	Fabrication Materials science Annealing (metallurgy) General Chemical Engineering Nucleation Oxide General Chemistry Contact angle Atomic layer deposition chemistry.chemical_compound Chemical engineering chemistry Thermal Hygroscopy Materials Chemistry
Zdroj:	Chemistry of Materials. 27:148-156
ISSN:	1520-5002 0897-4756
Popis:	Rare earth oxide (REO) atomic layer deposition (ALD) processes are investigated for hydrophobic coatings. Thermal and plasma-enhanced ALD (PE-ALD) Er2O3 and Dy2O3 are developed using the newly synthesized Er and Dy precursors bis-methylcyclopentadienyl-diisopropyl-acetamidinate-erbium and bis-isopropylcyclopentadienyl-diisopropyl-acetamidinate-dysprosium, with H2O and O2 plasma counter oxidants. The Er and Dy precursors show typical ALD growth characteristics with no nucleation incubation, indicating that they are suitable ALD precursors. The hydrophobicities of ALD-grown Er2O3 and Dy2O3 are investigated, together with those of ALD-grown Y2O3, La2O3, and CeO2 that were previously developed for high-k applications. All the ALD-grown REOs show high hydrophobicity, with water contact angles as high as 90°. After annealing at 500 °C in air for 2 h, hydrophobicity is degraded depending on the kind of material; this degradation is related to the hygroscopy of REOs. In addition, we demonstrate the fabrication of...
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::60339bf9212510c5700c9cdf053d81cf https://doi.org/10.1021/cm503659d Zobrazit plný text záznamu