Proximal probe lithography and surface modification
| Autor: | C. R. K. Marrian, E. S. Snow |
|---|---|
| Rok vydání: | 1996 |
| Předmět: |
Fabrication
Microscope Chemistry Nanotechnology Condensed Matter Physics Atomic and Molecular Physics and Optics Surfaces Coatings and Films Electronic Optical and Magnetic Materials law.invention law Surface modification Electrical and Electronic Engineering Scanning tunneling microscope Charged particle beam Lithography Low voltage Quantum tunnelling |
| Zdroj: | Microelectronic Engineering. 32:173-189 |
| ISSN: | 0167-9317 |
| DOI: | 10.1016/0167-9317(96)00005-6 |
| Popis: | The advantage of a low voltage approach to lithography and surface modification is that a more spatially localized energy deposition can be achieved than with a focused high energy charged particle beam. Proximal probes, such as the scanning tunnelling microscope or atomic force microscope with a conductive tip, are convenient ways to realize this approach. We summarize here research performed over the past few years at the Naval Research Laboratory directed towards materials studies and lithographic fabrication of structures and devices using proximal probes. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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