| Autor: |
K Hohmuth, B Rauschenbach |
| Rok vydání: |
1985 |
| Předmět: |
|
| Zdroj: |
Materials Science and Engineering. 69:489-499 |
| ISSN: |
0025-5416 |
| DOI: |
10.1016/0025-5416(85)90351-9 |
| Popis: |
Polycrystalline targets of titanium were implanted with nitrogen ions at energies from 30 to 60 ke V and with doses as high as 1 × 1018 N+ ions cm−2 at room temperature. The distributions of nitrogen and carbon were determined by Auger electron spectroscopy. The implanted-and-aged microstructures were examined using high voltage electron microscopy and selected area diffraction. The studies showed that the modification of the distribution of nitrogen implanted into titanium depends on the fluence. The effect of broadening and shifting of the range profiles is explained on the basis of atomic mixing. The formation and transformation of titanium nitride, carbide and carbonitride phases were investigated by electron microscopy. The growth of the titanium metalloid phases depends on the temperature and the fluence. The dependence of the phases analysed on implantation dose and temperature is represented in a type of phase diagram. The distribution of the orientations of titanium nitride crystallites in the titanium is demonstrated with a series of electron diffraction patterns. The orientations show an inhomogeneous distribution of the titanium nitride precipitate. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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