High-Power Compact Laser-Plasma Source for X-ray Lithography
| Autor: | James H. Morris, Juan R. Maldonado, Richard M. Foster, Richard Forber, Michael Powers, Gary French, C. J. Gaeta, Kelly L. Cassidy, Henry I. Smith, Michael Lim, Serge Campeau, I. C. Edmond Turcu, Peter Hark, Charles Kelsey, Harry Rieger, Joseph Naungayan |
|---|---|
| Rok vydání: | 2002 |
| Předmět: |
Distributed feedback laser
Materials science Physics and Astronomy (miscellaneous) business.industry General Engineering General Physics and Astronomy Laser law.invention X-ray laser Optics law Diode-pumped solid-state laser Optoelectronics X-ray lithography Laser power scaling Stepper business Lithography |
| Zdroj: | Japanese Journal of Applied Physics. 41:4111-4121 |
| ISSN: | 1347-4065 0021-4922 |
| DOI: | 10.1143/jjap.41.4111 |
| Popis: | A compact laser-produced plasma X-ray source that radiates 1 nm X-rays with an average power of 24 W in 2π steradians is presented. The X-ray conversion efficiency is 9% of the laser power delivered on target. The 300 W laser power is generated by a compact diode-pumped, solid-state Nd:YAG laser system. The X-ray source was used to demonstrate X-ray lithography of 75 nm lines. The X-ray source is optimized for integration with an X-ray stepper to provide a complete X-ray lithography exposure tool for the manufacture of high-speed GaAs devices. |
| Databáze: | OpenAIRE |
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