Annealing effect of SnO2 films prepared by chemical vapor deposition: Evidence of chlorine removal by auger electron spectroscopy and rutherford back-scattering spectrometry studies

Autor:	K. Kim, T.G. Finstad, R.W. Linton, X.B. Cox, W.K. Chu
Rok vydání:	1985
Předmět:	Auger electron spectroscopy Hydrogen Chemistry Annealing (metallurgy) General Engineering Chlorine Analytical chemistry chemistry.chemical_element Chemical vapor deposition Rutherford backscattering spectrometry Mass spectrometry Tin oxide
Zdroj:	Solar Cells. 13:301-307
ISSN:	0379-6787
DOI:	10.1016/0379-6787(85)90023-7
Popis:	Using a rather simple chemical vapor deposition apparatus, transparent conducting tin oxide films were fabricated through the decomposition of SnCl 4 ·5H 2 O. The films showed good electrical properties but high chlorine contamination. We have found that the chlorine can be removed by annealing at 500 K in a hydrogen ambient. This has been established by Auger electron spectroscopy and Rutherford backscattering spectrometry.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::5faa4d4f413d2d5b53303c94cd07c765 https://doi.org/10.1016/0379-6787(85)90023-7 Zobrazit plný text záznamu