Analysis of Component Depth Profiles at the Interface of Ti6242 Alloy and SiC, SiN Coatings after High Temperature Oxidation in Air

Autor: L. Pichon, Jean Paul Rivière, Arvaidas Galdikas, Teresa Moskalioviene
Rok vydání: 2010
Předmět:
Zdroj: Defect and Diffusion Forum. :433-438
ISSN: 1662-9507
DOI: 10.4028/www.scientific.net/ddf.297-301.433
Popis: We have analyzed the interfacial elemental depth profile evolution after high temperature isothermal oxidation of SixCy and SixNy protective coatings deposited by dynamic ion mixing on a Ti6242 alloy (Ti-6Al-2Sn-4Zr-2Mo). Isothermal oxidation tests have been carried out at 600°C during 100 hours in air. We have observed a non-monotonic depth distribution of zirconium in GDOES and SIMS depth profiles after oxidation of SiC/Ti6242 and SiN/Ti6242 and we propose a kinetic model based on rate equations for analyzing the results. It is shown by modeling that a non-monotonic depth profile of zirconium occurs because zirconium from the Ti6242 alloy forms a zirconium oxide compound. As a result, the atomic concentration of zirconium decreases at the interface which induces a diffusion flux of zirconium from the bulk to the interface. This process leads to the increase of the total amount of zirconium at the film interface and thus formation of a non-monotonic depth profile.
Databáze: OpenAIRE