Going the last nanometre

Autor: J P G Farr
Rok vydání: 2012
Předmět:
Zdroj: Transactions of the IMF. 90:69-77
ISSN: 1745-9192
0020-2967
DOI: 10.1179/0020296712z.0000000001.a
Popis: The fault-line persisting betwixt fundamental electrochemistry and electroplating technology derives, perhaps, from the slow advancement of hard knowledge of the fundamentals as much as from the su...
Databáze: OpenAIRE