Going the last nanometre
Autor: | J P G Farr |
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Rok vydání: | 2012 |
Předmět: | |
Zdroj: | Transactions of the IMF. 90:69-77 |
ISSN: | 1745-9192 0020-2967 |
DOI: | 10.1179/0020296712z.0000000001.a |
Popis: | The fault-line persisting betwixt fundamental electrochemistry and electroplating technology derives, perhaps, from the slow advancement of hard knowledge of the fundamentals as much as from the su... |
Databáze: | OpenAIRE |
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