Postionization of sputtered neutrals by a focused electron beam

Autor:	H.‐U. Gersch, Klaus Wittmaack
Rok vydání:	1993
Předmět:	Microprobe Ion beam Chemistry Surfaces and Interfaces Electron Condensed Matter Physics Mass spectrometry Surfaces Coatings and Films Ionization Physics::Accelerator Physics Atomic physics Electron beam-induced deposition Electron ionization Electron gun
Zdroj:	Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 11:125-135
ISSN:	1520-8559 0734-2101
DOI:	10.1116/1.578278
Popis:	We have explored a novel approach of electron‐impact postionization involving the use of a focused low‐energy electron beam directed at the flux of sputtered particles in very close proximity to the sample surface [‘‘matched’’ e‐beam sputtered neutral mass spectrometry (SNMS)]. The first version of an electron gun developed for this purpose delivers a 300 eV beam of ∼100 μA into a 100 μm spot. The postionization efficiency was investigated in a quadrupole based ion microprobe using samples of germanium and gallium arsenide bombarded with 10 keV Ar+. Singly and multiply charged species Mn+ (with n up to 5 for As) were produced by electron impact. The position and size of the electron beam with respect to the ion beam could be controlled and optimized by recording raster scanning ion images of the postionized species. Inspection of the energy spectra showed that the ionization probability is larger the lower the velocity of the sputtered neutrals. At low energies (
Databáze:	OpenAIRE
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