Optimization of Co-Pt and Co-Cr-Pt-Ta thin films for use in magnetic data storage devices
| Autor: | M.S. Miller, Y. M. Chow, L.A. Heuer, A.E. Schultz |
|---|---|
| Rok vydání: | 1994 |
| Předmět: |
Materials science
Alloy Metallurgy Analytical chemistry chemistry.chemical_element Surfaces and Interfaces General Chemistry Coercivity engineering.material Condensed Matter Physics Surfaces Coatings and Films chemistry Sputtering Cavity magnetron Materials Chemistry engineering Grain boundary Thin film Platinum Saturation (magnetic) |
| Zdroj: | Surface and Coatings Technology. :696-701 |
| ISSN: | 0257-8972 |
| Popis: | Co-Pt and Co-Cr-Pt-Ta thin films were deposited via magnetron deposition. The co-Pt films were deposited without heat or an underlayer. By proper optimization of sputtering conditions, it was found that 55 nm Co-Pt films with coercivities above 2300 Oe and saturation magnetizations of 760 emu cm-3 could be produced. Slower deposition rates, higher argon and base pressures produced the highest coercivity and lowestMs films. These results indicate the potential importance of grain boundary oxidation effects in determining the magnetic properties of these films. Results from atomic force microscopy and X-ray diffraction analysis of these films are also discussed. The influence of Pt content on the magnetic and recording properties of Co-Cr-Pt-Ta alloys was also studied. The platinum content was varied from 0 to 13 at.%. In general, the addition of platinum was found to decrease media saturation magnetization, coercive squareness and signal-to-noise ratio. Additions of a few atomic per cent platinum dramatically increased the coercivity of the alloy. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|